| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of producing a film of uniform structure and characteristics by suppressing occurrence of cooling irregularities in a film deposited on a base material, and as a result, providing products of consistent quality. SOLUTION: The invention relates to the film deposition apparatus for depositing a thin film by executing vapor deposition of a film deposition material on a surface of a base material 2. The film deposition apparatus includes a base material holder 3 for holding the base material, and a cooling block 4 which comes in contact with the base material holder to cool the base material holder. A magnet is built in at least any one of the base material holder and the cooling block. The base material is constituted of a magnetic material. COPYRIGHT: (C)2011,JPO&INPIT
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