发明名称 PHOTOCURABLE RESIN COMPOSITION, ARTICLE HAVING CURED FILM THEREOF AND METHOD FOR MANUFACTURING THE ARTICLE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photocurable resin composition that has high hardness, is excellent in transparency, antistatic properties, storage stability, moist heat resistance and adhesion under moist heat conditions and does not cause whitening regardless of the conveying speed on a coating line when cured by photoirradiation, to provide an article having a cured film of the photocurable resin composition and to provide a method for producing the article. <P>SOLUTION: The photocurable resin composition includes (1) inorganic oxide fine particles having an average particle size of not more than 80 nm, (2) a compound containing three or more (meth)acrylic groups, (3) a compound containing one or two (meth)acrylic groups, (4) an ionic compound represented by R<SP>1</SP>R<SP>2</SP>R<SP>3</SP>R<SP>4</SP>N<SP>+</SP>X<SP>-</SP>(wherein R<SP>1</SP>to R<SP>4</SP>each independently represent CH<SB>3</SB>, C<SB>2</SB>H<SB>5</SB>, C<SB>2</SB>H<SB>4</SB>OCH<SB>3</SB>, C<SB>6</SB>H<SB>13</SB>or C<SB>8</SB>H<SB>17</SB>; and X represents N(SO<SB>2</SB>CF<SB>3</SB>)<SB>2</SB>, BF<SB>4</SB>or PF<SB>6</SB>), (5) an ionic compound represented by Li<SP>+</SP>Y<SP>-</SP>(wherein Y represents ClO<SB>4</SB>, SO<SB>2</SB>CF<SB>3</SB>, SO<SB>2</SB>C<SB>2</SB>F<SB>5</SB>, N(SO<SB>2</SB>CF<SB>3</SB>)<SB>2</SB>, N(SO<SB>2</SB>C<SB>2</SB>F<SB>5</SB>)<SB>2</SB>, BF<SB>4</SB>or PF<SB>6</SB>) and (6) a radical photopolymerization initiator in a specific ratio. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011173990(A) 申请公布日期 2011.09.08
申请号 JP20100038924 申请日期 2010.02.24
申请人 TEIJIN CHEM LTD;SHIN-ETSU CHEMICAL CO LTD 发明人 MIZUNO TAKUYA;SOGO ISAO;YOSHIKAWA YUJI
分类号 C08F220/20;C08F220/26;C08J7/04;C08K9/06;C08L33/06 主分类号 C08F220/20
代理机构 代理人
主权项
地址