| 摘要 |
An atmospheric plasma apparatus for depositing a layer on a continuous base film transported in its longitudinal direction includes an electrode for treatment provided opposite to the peripheral surface of a drum electrode and upstream of an electrode for deposition in the direction of transportation of the base film, an electric power source for treatment which applies voltages to the electrode for treatment, and a reactive gas-feeding element for feeding a reactive gas for surface treatment between the drum electrode and the electrode for treatment. The atmospheric plasma apparatus as such is capable of depositing a layer without impairing effects of surface treatment, allowing a higher adhesion between the base film and the layer deposited thereon and, consequently, an efficient, successive deposition of a high-quality layer.
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