发明名称 SEMICONDUCTOR DEVICES WITH NON-PUNCH-THROUGH SEMICONDUCTOR CHANNELS HAVING ENHANCED CONDUCTION AND METHODS OF MAKING
摘要 Semiconductor devices are described wherein current flow in the device is confined between the rectifying junctions (e.g., p-n junctions or metal-semiconductor junctions). The device provides non-punch-through behavior and enhanced current conduction capability. The devices can be power semiconductor devices as such as Junction Field-Effect Transistors (VJFETs), Static Induction Transistors (SITs), Junction Field Effect Thyristors, or JFET current limiters. The devices can be made in wide bandgap semiconductors such as silicon carbide (SiC). According to some embodiments, the device can be a normally-off SiC vertical junction field effect transistor. Methods of making the devices and circuits comprising the devices are also described.
申请公布号 US2011217829(A1) 申请公布日期 2011.09.08
申请号 US201113108505 申请日期 2011.05.16
申请人 SEMISOUTH LABORATORIES, INC. 发明人 SANKIN IGOR;SHERIDAN DAVID C.;MERRETT JOSEPH NEIL
分类号 H01L21/205 主分类号 H01L21/205
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