| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new synthesis method for a photoacid generator compound (PAG), a new photoacid generator compound, and photoresist composition including the PAG compound. <P>SOLUTION: The new photoacid generator compound (PAG) comprises sulfonium (>S+) component for using in the photoresist composition of a positive or negative type. In particular, a preferred sulfonium-containing PAG comprises difluorosulfonic acid cation component (for example, R-CF2SO3-, herein R is a non-hydrocarbon substituent group). Further, the synthesis method for producing the photoacid generator including sulfonium is to synthesize a cyclopentyl, cyclohexyl or cycloheptyl sulfonium PAG (for example, RS+<(CH2)4-6 (wherein R is the non-hydrocarbon substituent group)) by cyclising substituted alkylsulfide. <P>COPYRIGHT: (C)2011,JPO&INPIT |
