LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING POSITION OF STAGE OF LITHOGRAPHIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus having an improved positioning accuracy of a stage thereof.

SOLUTION: A lithographic apparatus includes: a stage that holds an object and is movable relative to a reference structure within a motion range; a magnet structure that provides a spatially varying magnetic field in at least a part of the motion range and is movable relative to the reference structure and the stage; a first position measuring system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measuring direction relative to the reference structure; a second position measuring system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor that corrects the first measurement signal with a value dependent on the second measurement signal to provide a first corrected measurement signal representing the position of the stage and/or the object in the measuring direction relative to the reference structure.

COPYRIGHT: (C)2011,JPO&INPIT