| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve a plasma processing apparatus for achieving circularly polarized wave processing of microwaves to wide plasma processing conditions and obtaining plasma processing characteristics having improved axisymmetry, and to provide a processing method in the plasma processing apparatus using microwaves. <P>SOLUTION: For enhancing axisymmetry of plasma processing using a circularly polarized wave generator for conducting a circularly polarized wave processing of microwaves regardless of reflection waves, stubs 403, 404 are provided at a side of a circular waveguide 405 in a circle/rectangle converter 402 and the stubs 403, 404 are made cylindrical and the tip is made semicircular. <P>COPYRIGHT: (C)2011,JPO&INPIT |
