| 摘要 |
PROBLEM TO BE SOLVED: To suppress the evaporation of part of a medium to be imprinted from a substrate before the medium to be imprinted is imprinted by a template in imprint lithography. SOLUTION: A lithographic apparatus includes: a template set holder 401 to hold a plurality of imprint templates 400; and a substrate holder to hold a substrate 403. The imprint templates 400 and the template set holder 401 are covered with a liquid layer of a silicon rich monomer by spin coating, and the template set holder 401 is arranged under the substrate holder. COPYRIGHT: (C)2011,JPO&INPIT |
