发明名称 Apparatus and method relating to the focusing of charged particles
摘要 A module of an apparatus for producing and acting upon two parallel ion beams 1701 which are parallel to the plane of symmetry 1702. The beams 1701 enter the quadrupole field of the permanent magnet pole array 1716 and the required multiple ion species of different parameter values are brought to a series of focal points and transmitted through a resolving structure. This allows for the removal of unwanted beams and allowing wanted beams to exit the magnet array either side of component 1704.
申请公布号 GB2478265(A) 申请公布日期 2011.09.07
申请号 GB20080016014 申请日期 2008.09.03
申请人 SUPERION LIMITED 发明人 DEREK AITKEN
分类号 H01J49/20;H01J37/317;H01J49/30 主分类号 H01J49/20
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