发明名称
摘要 In a gas supply device called a gas shower head or the like, the occurrence of dense areas of particles such as cross-like particles is suppressed and the degree of freedom of process conditions is increased by making more uniform the flow velocity distribution of gas flows from the center to the outer peripheral parts of a board along the circumferential direction than before. The arrangement pattern of gas supply holes formed in the shower plate of the gas supply device is so set that these holes are arranged on a large number of concentric circles and that a gas supply hole on a concentric circle and gas supply holes nearest that gas supply hole and on concentric circles respectively inwardly and outwardly adjacent to that concentric circle are not arranged in the radial direction of the concentric circles.
申请公布号 KR101063105(B1) 申请公布日期 2011.09.07
申请号 KR20097002282 申请日期 2007.07.31
申请人 发明人
分类号 H01L21/205;H01L21/31 主分类号 H01L21/205
代理机构 代理人
主权项
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