发明名称 Race track configuration and method for wafering silicon solar substrates
摘要 <p>A system for manufacturing free-standing films from work pieces. The system includes a racetrack structure (1000) being configured to transfer at least one work piece and one or more accelerator-based ion implanters (1001,1002,1003,100N) coupled to the racetrack structure (1000) via an end station (1011,1012,1013,101N). Each of the accelerator-based ion implanters (1001,1002,1003,100N) is configured to introduce particles having an energy of greater than 1 MeV to implant into a surface of the work piece loaded in the end station (1011,1012,1013,101N) to form a cleave region in the work piece. The system includes one or more cleave modules (1211,1212,121N) coupled to the racetrack structure (1000) configured to perform a cleave process to release a free-standing film from the work piece along the cleave region. Additionally, the system includes an output port (1311,1312) coupled to each cleave module (1211,1212,121N) to output the free standing film detached from the work piece and one or more service modules each connected to the racetrack structure (1000).</p>
申请公布号 EP2159025(A3) 申请公布日期 2011.09.07
申请号 EP20090252046 申请日期 2009.08.25
申请人 SILICON GENESIS CORPORATION 发明人 HENLEY, FRANCOIS J.;BRAILOVE, ADAM
分类号 B28D5/00;H01L21/762 主分类号 B28D5/00
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