发明名称 Method and apparatus for workpiece surface modification for selective material deposition
摘要 In some embodiments, a workpiece-surface-influencing device preferentially contacts the top surface of the workpiece, to chemically modify the surface at desired field areas of the workpiece without affecting the surfaces of cavities or recesses in the field areas. The device includes a substance which is chemically reactive with material forming the workpiece surface. The substance can be in the form of a thin film or coating which contacts the surface of the workpiece to chemically modify that surface. The workpiece-surface-influencing device can be in the form of a solid state applicator such as a roller or a semi-permeable membrane. In some other embodiments, the cavities are filled with material that prevents surface modification of the cavity surfaces while allowing modification of the field areas, or which encourages surface modification of the cavity surfaces while preventing modification of the field areas. The modified surface facilitates selective deposition of materials on the workpiece.
申请公布号 US8012875(B2) 申请公布日期 2011.09.06
申请号 US20100757652 申请日期 2010.04.09
申请人 IPGRIP, LLC 发明人 VASILEV VLADISLAV
分类号 H01L21/44 主分类号 H01L21/44
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