发明名称 Phase change random access memory for actively removing residual heat and method of manufacturing the same
摘要 A phase change random access memory for actively removing residual heat and a method of manufacturing the same are presented. The phase change random access memory includes a semiconductor substrate, a phase change pattern, a heating electrode and a cooling electrode. The phase change pattern is on the semiconductor substrate. The heating electrode is electrically coupled to the phase change pattern for heating the phase change pattern. The cooling electrode is electrically coupled to the phase change pattern for removing residual heat from the phase change pattern.
申请公布号 US8013318(B2) 申请公布日期 2011.09.06
申请号 US20090494530 申请日期 2009.06.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 RHO DAE HO
分类号 H01L47/00 主分类号 H01L47/00
代理机构 代理人
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