| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing finished goods in a high yield in the production of microstructures using an HSQ resist. <P>SOLUTION: The method for producing microstructures includes: a step 1 of preparing a laminated body formed by stacking a substrate, a resist layer containing hydrosilsesquioxane, and a layer containing a water-soluble conductive polymer compound, in this order, and subjecting the laminated body to irradiation with charged particle radiation and development to prepare a resist pattern-attached substrate comprising a substrate provided with a resist pattern; a step 2 of observing the resist pattern with a scanning microscope and judging the observed resist pattern-attached substrate to be non-defective or defective based on the result of the observation; and a step 3 of producing a microstructure using the non-defective substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT |
