发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD
摘要 A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin.
申请公布号 US2011212401(A1) 申请公布日期 2011.09.01
申请号 US201113045962 申请日期 2011.03.11
申请人 JSR CORPORATION 发明人 NISHIMURA YUKIO;MATSUDA YASUHIKO;NAKAGAWA HIROKI;FUJISAWA TOMOHISA;HAMA YUKARI;KASAHARA KAZUKI
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
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