发明名称 |
METHODS FOR DETECTING METAL PRECIPITATES IN A SEMICONDUCTOR WAFER |
摘要 |
Methods are disclosed for monitoring the amount of metal contamination imparted during wafer processing operations such as polishing and cleaning. The methods include subjecting a silicon-on-insulator structure to the semiconductor process, precipitating metal contamination in the structure and delineating the metal contaminants.
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申请公布号 |
US2011212550(A1) |
申请公布日期 |
2011.09.01 |
申请号 |
US201113105392 |
申请日期 |
2011.05.11 |
申请人 |
MEMC ELECTRONIC MATERIALS, INC. |
发明人 |
LIBBERT JEFFREY L.;FEI LU |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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