| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that forms a pattern having good resolution, line width roughness, and line edge roughness. <P>SOLUTION: The photoresist composition comprises: a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by the action of an acid; an acid generator; and a compound represented by formula (I). In the formula (I), Z<SP>1</SP>represents a 7-20C alkylene group, a 3-20C divalent saturated cyclic hydrocarbon group, or a group formed by combining a 1-6C alkylene group with a 3-20C divalent saturated cyclic hydrocarbon group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
