| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
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| 申请公布号 |
US2011211181(A1) |
申请公布日期 |
2011.09.01 |
| 申请号 |
US201113102620 |
申请日期 |
2011.05.06 |
| 申请人 |
ASML NETHERLANDS B.V.;CARL ZEISS SMT AG |
发明人 |
STREEFKERK BOB;BASELMANS JOHANNES JACOBUS MATHEUS;ENGELEN ADRIANUS FRANSISCUS PETRUS;FINDERS JOZEF MARIA;GRAEUPNER PAUL;MULKENS JOHANNES CATHARINUS HUBERTUS;VAN SCHOOT JAN BERNARD PLECHELMUS |
| 分类号 |
G03B27/52;G03F7/20;G03F7/207;H01L21/027 |
主分类号 |
G03B27/52 |
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