发明名称 |
UV ABSORPTION BASED MONITOR AND CONTROL OF CHLORIDE GAS STREAM |
摘要 |
A semiconductor growth system includes a chamber and a source of electromagnetic radiation. A detector is arranged to detect absorption of radiation from the source by a chloride- based chemical of the reaction chamber. A control system controls the operation of the chamber in response to the absorption of radiation by the chloride-based chemical. The control system controls the operation of the chamber by adjusting a parameter of the reaction chamber.
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申请公布号 |
US2011212546(A1) |
申请公布日期 |
2011.09.01 |
申请号 |
US200913060639 |
申请日期 |
2009.07.21 |
申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES |
发明人 |
BERTRAM JR. RONALD THOMAS;ARENA CHANTAL;WERKHOVEN CHRISTIAAN J.;TISCHLER MICHAEL ALBERT;VORSA VASIL;JOHNSON ANDREW D. |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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