发明名称 UV ABSORPTION BASED MONITOR AND CONTROL OF CHLORIDE GAS STREAM
摘要 A semiconductor growth system includes a chamber and a source of electromagnetic radiation. A detector is arranged to detect absorption of radiation from the source by a chloride- based chemical of the reaction chamber. A control system controls the operation of the chamber in response to the absorption of radiation by the chloride-based chemical. The control system controls the operation of the chamber by adjusting a parameter of the reaction chamber.
申请公布号 US2011212546(A1) 申请公布日期 2011.09.01
申请号 US200913060639 申请日期 2009.07.21
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 BERTRAM JR. RONALD THOMAS;ARENA CHANTAL;WERKHOVEN CHRISTIAAN J.;TISCHLER MICHAEL ALBERT;VORSA VASIL;JOHNSON ANDREW D.
分类号 H01L21/66 主分类号 H01L21/66
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