LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
<p>A lithographic apparatus includes an optical column capable of creating a pattern on a target portion of a substrate. The optical column has a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may have an actuator to move the optical column, or a part thereof, with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system.</p>
