发明名称 THROUGH-HOLE PLATING METHOD AND SUBSTRATE PRODUCED BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a through-hole plating method by which only an inner surface of a through-hole can easily and quickly be subjected to plating inexpensively, and to provide a substrate produced by using the same. SOLUTION: A substrate intermediate 4 which has through-holes 7 penetrating an insulating layer 6 and two conductive masks 5 having openings in positions corresponding to the through-holes 7 are used. Entire regions of both front and rear surfaces of the substrate intermediate 4 are covered with the respective conductive masks 5 while fitting the position of the opening to the through-hole 7. A body 2 to be plated is formed by bringing the respective conductive masks 5 into close contact with at least a part of both front and rear surfaces of the substrate intermediate 4. The body 2 to be plated is immersed in a plating liquid 3, the entire surface of the body 2 to be plated including the inner surface of the through-hole 7 is plated by adhering metal thereto, and then the conductive masks 5 are removed from the substrate intermediate 4. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011168808(A) 申请公布日期 2011.09.01
申请号 JP20100031210 申请日期 2010.02.16
申请人 MEIKO:KK 发明人 TANE NORIAKI;SAITO YOICHI;TAKII HIDEYOSHI
分类号 C25D5/02;C25D7/00;H05K3/42 主分类号 C25D5/02
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