COPPER OXIDE ETCHANT AND ETCHING METHOD USING SAME

摘要

Disclosed is a copper oxide etchant, which, when using a copper oxide as a thermal reaction resist material and exposed with a laser, is capable of selectively etching exposed/unexposed areas; also disclosed is an etching method using the same. The disclosed copper oxide etchant selectively etches copper oxides of different oxidation numbers in a copper oxide-containing layer having a copper oxide as the main component, and is characterized by containing at least a chelating agent or a salt thereof.