MASK BLANK GLASS SUBSTRATE, MASK BLANK, MASK AND REFLECTIVE MASK AND METHOD FOR MANUFACTURING THESE

摘要

PROBLEM TO BE SOLVED: To properly form a marker less liable to cause dust generation on a mask blank glass substrate.

SOLUTION: A mask blank glass substrate used in the manufacture of a mask blank is prepared and a marker 18 expressing information for identifying or managing the mask blank glass substrate in a plurality of recesses 20 is formed on the surface of a region of the mask blank glass substrate having no influence on the fabrication of a transfer pattern. The recesses 20 constituting the marker 18 are round pits having substantially circular edges, and the interval L1 between the adjacent recesses 20 is ≥50 μm. The marker 18 is formed, e.g., on an end face of the mask blank glass substrate.

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