| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which ensures excellent resolution and shape of a pattern obtained therefrom. <P>SOLUTION: The resist composition comprises an aromatic compound and an acid generator, wherein the aromatic compound has an acid-labile group and a molecular weight of 300-2,000, and the acid generator is a resin having a structural unit represented by formula (I), wherein R<SP>1</SP>represents a hydrogen atom, a halogen atom or a 1-6C alkyl group which may have a halogen atom; L represents a single bond or a divalent 1-17C saturated hydrocarbon group which may have a substituent; W represents a divalent 3-36C alicyclic hydrocarbon group which may have a substituent or a divalent 6-36C aromatic hydrocarbon group which may have a substituent; X<SP>1</SP>represents a divalent 1-17C saturated hydrocarbon group which may have a substituent; R<SP>d</SP>represents a hydrogen atom or a 1-6C alkyl group; Q<SP>a</SP>and Q<SP>b</SP>each independently represent a fluorine atom or a 1-6C perfluoroalkyl; Z<SP>a+</SP>represents an organic cation; and * represents a bond. <P>COPYRIGHT: (C)2011,JPO&INPIT |
