发明名称 CONTACT STRUCTURE OF ORGANIC SEMICONDUCTOR DEVICE, ORGANIC SEMICONDUCTOR DEVICE, AND METHOD OF FABRICATING THE SAME
摘要 PROBLEM TO BE SOLVED: To reduce contact resistance of an organic semiconductor device, without making a device fabricating process very complex. SOLUTION: For example, in the organic semiconductor FET shown in the figure, a current flowing from a source or drain electrode 4 to an opposite-side electrode concentrates on an end of the electrode 4 which is close to the opposite-side electrode. A metal oxide layer 5 is provided there. Through charge migration between an organic semiconductor layer 3 and the metal oxide layer 5, a region including a plenty of carriers and a small number of traps is formed up to near the end of the electrode 4 in which the current concentrates, thereby the contact resistance is greatly reduced. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011171524(A) 申请公布日期 2011.09.01
申请号 JP20100034179 申请日期 2010.02.19
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 MITSUNARI TAKEO;KUMAGAI AKIYA;TSUKAGOSHI KAZUHITO
分类号 H01L29/786;H01L51/05 主分类号 H01L29/786
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