发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which enables externally recognizing a rate of correction of a reference value for a measuring instrument. SOLUTION: An output unit 122 of a control unit 120 outputs ON/OFF signals to an MFC 84 and a pressure sensor 112. The MFC 84 and the pressure sensor 112 execute reference value correction by exerting their respective reference value correction functions when, for example, receiving an ON signal from the output unit 122, while canceling the reference value correction by the reference value correction functions when receiving an OFF signal from the output unit 122. A calculating unit 128 of the control unit 120 calculates a correction rate based on output voltages before and after the reference value correction, and the control unit 120 causes a display unit 132 to display the calculated correction rate. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011171337(A) 申请公布日期 2011.09.01
申请号 JP20100031008 申请日期 2010.02.16
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YOSHINO AKIO
分类号 H01L21/02;C23C16/52 主分类号 H01L21/02
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