USE OF HIGH ENERGY HEAVY ION BEAM FOR DIRECT SPUTTERING

摘要

High energy heavy ions are used to produce free space regions by sputtering the high energy beam through a mask onto a substrate. The invention also includes a method of focusing the high energy beam with a beam focusing system. The invention is in part based on an experiment in which 900 keV gold ions were used to sputter aluminum, copper, silicon and silver. The results demonstrate the possibility that high energy heavy ions could be used to fabricate microstructures in selected metals and silicon in a single step process.