发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>A lithographic apparatus includes an optical column configured to create a pattern on a target portion of a substrate, the optical column including a controllable element (906) configured to provide a beam; and a projection system configured to project the beam onto the target portion; an actuator (936) configured to move at least a part (924, 940) of the optical column with respect to the substrate; a measurement system (938, 940) configured to measure a position of the at least part of the optical column; and a controller (942) configured to drive the controllable element, the controller being provided with an output signal of the measurement system.</p> |
申请公布号 |
WO2011104179(A1) |
申请公布日期 |
2011.09.01 |
申请号 |
WO2011EP52407 |
申请日期 |
2011.02.18 |
申请人 |
ASML NETHERLANDS B.V.;ONVLEE, JOHANNES;VAN ZWET, ERWIN;KOPPELMANS, JOHANNES |
发明人 |
ONVLEE, JOHANNES;VAN ZWET, ERWIN;KOPPELMANS, JOHANNES |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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