| 摘要 |
<P>PROBLEM TO BE SOLVED: To distinguish a used mask for wiring easily and reliably while reducing a confirmation man-hour. <P>SOLUTION: A method of distinguishing a mask for wiring includes a lithography step for forming a resistance element region including a plurality of resistance elements 41, 42 and 43 equipped with terminals at both ends together with a predetermined wiring pattern by using a predetermined mask for wiring, a lithography step for forming an identification region 50 including connection wiring which are connected in series or parallel between the terminals of the resistance elements depending on a unique wiring pattern together with the unique wiring pattern of a semiconductor wafer by using a mask for identification wiring 51, and a lithography step for forming an exposed pad 19 connected with the connection wiring by using a mask for pad wiring. A set of a resistance element region and an identification region of the first and second wiring layers is formed on a TEG chip or a scribe line. Furthermore, the method includes a step for measuring the resistance of the connection wiring of a resistance element connected in series or parallel through an exposed pad. <P>COPYRIGHT: (C)2011,JPO&INPIT |
