发明名称 COATING PROCESSING METHOD, RECORDING MEDIUM IN WHICH PROGRAM FOR PERFORMING THE SAME IS RECORDED, AND COATING PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a coating processing method, capable of reducing an amount of coating liquid required for covering a whole surface of a substrate with the coating liquid, when various types of coating liquids are applied to the whole faces of the substrate. SOLUTION: In the coating processing method, the coating liquid is applied to the surface of the substrate by supplying the coating liquid to the surface of the rotating substrate and spreading the supplied coating liquid to an outer peripheral side of the substrate. The method includes a supply process S17 for supplying the coating liquid to the surface of the substrate while a supply position where the coating liquid is supplied to the surface of the rotating substrate is moved to the outer peripheral side with movement of the coating liquid spread to the outer peripheral side. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011171443(A) 申请公布日期 2011.09.01
申请号 JP20100032590 申请日期 2010.02.17
申请人 TOKYO ELECTRON LTD 发明人 YOSHIHARA KOSUKE;HATAKEYAMA SHINICHI
分类号 H01L21/027;B05C11/08 主分类号 H01L21/027
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