LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
<p>A lithographic apparatus including an optical column configured to project a beam on a target portion of a substrate, the optical column including a radiation source configured to emit the beam; and, a projection system configured to project the beam onto the target portion; an actuator configured to move the optical column or a part thereof with respect to the substrate; a radiation source driver configured to provide driving power to the radiation source, the radiation source driver comprising a power adjustment controller configured to adjust the power to be provided to the radiation source as a function of a previous power provided to the radiation source.</p>
