| 发明名称 |
DRIER, WETTING UNIT, AND METHOD FOR REMOVING LIQUID FROM SURFACE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus with favorable liquid removing performance. <P>SOLUTION: A new method is disclosed useful for immersion lithography, a new method for drying and/or wetting a surface, such as an upper surface of a substrate. The surface is positioned under a single phase extractor, and priming liquid is delivered between the single phase extractor and the surface. The single phase extractor operates only after the priming liquid is provided between the single phase extractor and the surface. The priming liquid is delivered to the single phase extractor throughout the process to dry and/or to wet. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011171767(A) |
申请公布日期 |
2011.09.01 |
| 申请号 |
JP20110124883 |
申请日期 |
2011.06.03 |
| 申请人 |
ASML NETHERLANDS BV;ASML HOLDING NV |
发明人 |
ANTONIUS LEENDERS MARTINUS HENDRIKUS;LAMBERTUS DONDERS SJOERD NICOLAAS;SEWELL HARRY;MARKOYA LOUIS JOHN;VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS;MCCAFFERTY DIANE C |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
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