| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cover fixture, capable of suppressing, in an inductively-coupled plasma treatment device, breakage of a cover which covers the lower surface of a window member and generation of particles while facilitating the attachment/detachment of the cover, and further enhancing the flexibility in design of gas introduction. <P>SOLUTION: The dielectric cover fixture 18 includes: support portions 18a supporting a part of a first partial cover 12A and a part of a second partial cover 12B; and a base portion 18b. The base portion 18b has a protruding portion 18b1 protruding in a circular shape at an upper part thereof, and a thread 18b2 is formed on the circumference of the projection 18b. A gas inlet path 101 to be connected to a gas inlet path 21b is formed inside the protruding portion 18b in the base portion 18b. The gas inlet path 101 constitutes a part of a gas flow passage, allowing the gas inlet path 21b to communicate with the inside of a treatment chamber 5. A gas hole 101a is provided to extend through the bottom wall of the base portion 18b, and constitutes a part of the gas inlet path 101. <P>COPYRIGHT: (C)2011,JPO&INPIT |
