<p>There is described an apparatus for cleaning a filter cloth, comprising: a cleaning station comprising a gas flow device and a support surface defining an aperture; and a collection device positioned below the aperture for receiving material removed from the filter cloth; wherein the gas flow device is configured to provide a flow of gas through an area of filter cloth located above the aperture so as to remove material from the filter cloth and direct it into the collection device.</p>
申请公布号
WO2011104511(A1)
申请公布日期
2011.09.01
申请号
WO2011GB00257
申请日期
2011.02.24
申请人
MICROBIAL SOLUTIONS LIMITED;AGER, DUANE;GOODALL, TIMOTHY;POPE, WILLIAM