| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of suppressing pattern collapse of a pattern obtained therefrom. <P>SOLUTION: The resist composition contains an antioxidant, a solvent, a resin and an acid generator, wherein the solvent contains at least one solvent with a boiling point of ≥156°C (provided that ethyl lactate is excluded), and the antioxidant is a phenol derivative of a specific structure, e.g., 2,6-bis(1,1-dimethylethyl)-4-methylphenol. <P>COPYRIGHT: (C)2011,JPO&INPIT |
