| 摘要 |
<P>PROBLEM TO BE SOLVED: To more accurately evaluate an effect of laser light source over the exposure pattern of spectrum of laser beam or imaging performance, when the laser light source is used as a source of exposure light. <P>SOLUTION: A laser light source 16 which outputs laser beam includes beam monitor mechanism 16c which measures spectrum of laser beam, and a laser controller 16e which obtains information from a measurement result by the beam monitor mechanism 16c on a center wavelength of laser beam and a wavelength offset of laser beam corresponding to a displacement from the center wavelength and a light intensity at each wavelength of laser beam, and then outputs the information. <P>COPYRIGHT: (C)2011,JPO&INPIT |
