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发明名称
MOTHOD FOR ETCHING ATOMIC LAYER USING NEUTRAL BEAM ETCHING APPARATUS
摘要
申请公布号
KR20110098355(A)
申请公布日期
2011.09.01
申请号
KR20100017932
申请日期
2010.02.26
申请人
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION
发明人
YEOM, GEUN YOUNG;LIM, WOONG SUN;KIM, YI YEON;PARK, BYOUNG JAE;YEON, JE KWAN
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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