| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a black matrix where increase of regular reflectance and diffuse reflectance is suppressed even after a high temperature process and reflectance characteristics is not rapidly changed relative to variance in film thickness. <P>SOLUTION: This invention relates to the black matrix 5 which is formed on a substrate 6, and is constituted of four layers formed by stacking a first film 1, a second film 2, a third film 3, and a fourth film 4 in this order, wherein each film consists of a transition metal oxide and a silicon oxide. A relationship: (refractive index of the first film)=(refractive index of the third film)<(refractive index of the second film)=(refractive index of the fourth film) is satisfied, and the fourth film has the same composition as a whole, and a boundary is recognized within the fourth film when seen on a TEM picture. <P>COPYRIGHT: (C)2011,JPO&INPIT |
