| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for polishing a glass substrate capable of stably supplying excellent polishing quality even when using polishing liquid circulatingly. SOLUTION: The method for polishing the glass substrate is a method for mirror-surface-polishing the surface of the glass substrate by supplying the polishing liquid containing polishing abrasive grains to the surface of the glass substrate. The method for polishing the glass substrate includes a zeta potential monitoring step for monitoring a zeta potential and a zeta potential adjusting step for adding a zeta potential-adjusting agent to allow the absolute value of the zeta potential to be a predetermined value or more when the absolute value of the zeta potential in the zeta potential monitoring step is below the predetermined value. COPYRIGHT: (C)2011,JPO&INPIT |
