发明名称 |
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME |
摘要 |
A photomask blank is for use in manufacturing a photomask to be applied with exposure light having a wavelength of 200 nm or less. The photomask blank has a light-transmitting substrate and a light-shielding film formed thereon. The light-shielding film has a light-shielding layer containing a transition metal and silicon and a front-surface antireflection layer formed contiguously on the light-shielding layer and made of a material containing at least one of oxygen and nitrogen. The light-shielding film has a front-surface reflectance of a predetermined value or less for the exposure light and has a property capable of controlling the change width of the front-surface reflectance at the exposure wavelength to be within 2% when the thickness of the front-surface antireflection layer changes in the range of 2 nm. The material of the front-surface antireflection layer having a refractive index n and an extinction coefficient k capable of achieving such property is selected.
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申请公布号 |
US2011212392(A1) |
申请公布日期 |
2011.09.01 |
申请号 |
US200913126614 |
申请日期 |
2009.10.27 |
申请人 |
HOYA CORPORATION |
发明人 |
IWASHITA HIROYUKI;KOMINATO ATSUSHI;HASHIMOTO MASAHIRO;SHISHIDO HIROAKI |
分类号 |
G03F1/46;G03F1/50;G03F1/54;G03F7/20 |
主分类号 |
G03F1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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