| 发明名称 |
CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN |
| 摘要 |
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator. |
| 申请公布号 |
KR20110097810(A) |
申请公布日期 |
2011.08.31 |
| 申请号 |
KR20117012887 |
申请日期 |
2009.12.02 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA KUNIHIKO;SAKITA KYOUHEI;YONEZAWA HIROYUKI |
| 分类号 |
C08F20/30;B29C43/00;C08F2/48;C08L33/04 |
主分类号 |
C08F20/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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