发明名称 METHOD FOR MANUFACTURING A MULTI_LAYER STACK STRUCTURE WITH IMPROVED WVTR BARRIER PROPERTY
摘要 A method and apparatus for manufacturing a multi-layer stack structure (12), the structure (12) comprising in order: a substrate (6a) a barrier layer (14) an adhesive layer (15) a barrier layer (14) a substrate (6b). The method comprises: a) providing two substrates (6a, 6b) in a single treatment space (5), the treatment space (5) comprising at least two electrodes (2, 3) for generating an atmospheric pressure glow discharge plasma in the treatment space (5); b) treating the facing surfaces of the two substrates (6a, 6b) simultaneously in the single treatment space (5); c) laminating the two treated substrates (6a, 6b) with an adhesive layer (15) in between the facing surfaces to obtain the multi-layer stack structure (12).
申请公布号 EP2241165(B1) 申请公布日期 2011.08.31
申请号 EP20090708722 申请日期 2009.01.22
申请人 FUJIFILM MANUFACTURING EUROPE B.V. 发明人 DE VRIES, HINDRIK WILLEM;VAN DE SANDEN, MAURITIUS CORNELIUS MARIA
分类号 H05H1/24;G21K1/06 主分类号 H05H1/24
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