发明名称 |
Vertical power semiconductor device and method of making the same |
摘要 |
<p>A power MOSFET (10) includes a semiconductor substrate having a drift region (102) therein and a transition region (130) that extends between the drift region and a first surface (102a) of the semiconductor substrate. The transition region has a vertically retrograded doping profile therein that peaks at a first depth relative to the first surface. First and second trenches (104) in which an insulated electrode (106,110) is located are moreover provided in the semiconductor substrate. First and second base shielding regions (128) may be provided under respective first and second base regions (126) to deplete the transition region.</p> |
申请公布号 |
EP2362423(A2) |
申请公布日期 |
2011.08.31 |
申请号 |
EP20110166103 |
申请日期 |
2002.04.05 |
申请人 |
SILICON SEMICONDUCTOR CORPORATION |
发明人 |
BALIGA, BANTVAL JAYANT |
分类号 |
H01L29/78;H01L21/336;H01L21/76;H01L29/06;H01L29/08;H01L29/10;H01L29/36;H01L29/40;H01L29/417;H01L29/872 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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