PELLICLE FOR LITHOGRAPHY AND MANUFACTURING METHOD FOR PELLICLE LAYER

摘要

Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to the pellicle for lithography. The pellicle 1 for lithography is comprised of a frame-like pellicle frame 4 having one open frame on one side of the pellicle frame and another open frame on another side of the pellicle frame; and a laser beam transmissive pellicle film 2 for lithography, which is attached to the one side of the pellicle frame. The another open frame is capable of attaching to a photomask 10 and the pellicle film has a venting hole 7 having a hole size through which a gas molecule 15 can pass but not a foreign particle 16.