发明名称 Field transistors for electrostatic discharge protection and methods for fabricating the same
摘要 A field transistor for electrostatic discharge (ESD) protection and method for making such a transistor is described. The field transistor includes a gate conductive layer pattern formed on a field oxide layer. Since the gate conductive layer pattern is formed on the field oxide layer, a thin gate insulating layer having a high possibility of insulation breakdown is not used. To form an inversion layer for providing a current path between source and drain regions, a field oxide layer is interposed to form low concentration source and drain regions overlapped by the gate conductive layer pattern.
申请公布号 US8008725(B2) 申请公布日期 2011.08.30
申请号 US20020071494 申请日期 2002.02.06
申请人 FAIRCHILD KOREA SEMICONDUCTOR LTD 发明人 KANG TAEG-HYUN;RYU JUN-HYEONG;KIM JONG-HWAN
分类号 H01L27/04;H01L27/088;H01L21/336;H01L27/02;H01L29/78 主分类号 H01L27/04
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