发明名称 Dual work function recessed access device and methods of forming
摘要 A recessed access device having a gate electrode formed of two or more gate materials having different work functions may reduce the gate-induced drain leakage current losses from the recessed access device. The gate electrode may include a first gate material having a high work function disposed in a bottom portion of the recessed access device and a second gate material having a lower work function disposed over the first gate material and in an upper portion of the recessed access device.
申请公布号 US8008144(B2) 申请公布日期 2011.08.30
申请号 US20060432270 申请日期 2006.05.11
申请人 MICRON TECHNOLOGY, INC. 发明人 ANANTHAN VENKATESAN;TANG SANH D.
分类号 H01L29/94 主分类号 H01L29/94
代理机构 代理人
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