发明名称 Uniform background radiation in maskless lithography
摘要 A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.
申请公布号 US8009270(B2) 申请公布日期 2011.08.30
申请号 US20070689926 申请日期 2007.03.22
申请人 ASML NETHERLANDS B.V. 发明人 DESMEDT PAUL ANTOON CYRIEL;TINNEMANS PATRICIUS ALOYSIUS JACOBUS;CUPERUS MINNE
分类号 G03B27/42 主分类号 G03B27/42
代理机构 代理人
主权项
地址