发明名称 Method for fabricating an integrated circuit including memory element with spatially stable material
摘要 A method for fabricating an integrated circuit, the method comprises forming a first electrode, depositing resistance changing material over the first electrode, the resistance changing material having an active zone for switching the resistance of the resistance changing material and an inactive zone, and forming a second electrode over the resistance changing material. The chemical composition of the resistance changing material in the active zone differs from the chemical composition of the resistance changing material in the inactive zone.
申请公布号 US8009468(B2) 申请公布日期 2011.08.30
申请号 US20080167853 申请日期 2008.07.03
申请人 QIMONDA AG 发明人 ANDRES DIETER;HAPP THOMAS;MAJEWSKI PETRA;RUF BERNHARD
分类号 G11C11/00 主分类号 G11C11/00
代理机构 代理人
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