| 摘要 |
<p>The present invention relates to a sputtering target including (Co and Pt) or (Co, Cr, and Pt); Si0[err] and/or Ti0[err];and Co[err]O[err] and/or CoO. A magnetic recording film having a granular structure and high coercivity can be formed by performing sputtering using the sputtering target according to the present invention. By producing the sputtering target according to the present invention by sintering a powder ofraw materials at 1000°C or lower, Si0[err], Ti0[err], CO[err]O[err], and CoO can be prevented from being reduced during the sintering to give a more effective sputtering target.</p> |
