LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

225A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the final element of the projection system and the substrate W. Several methods are disclosed for protecting components of the projection system, substrate table anda liquid confinement system. These include providing a protective coating on the final10 element 20 of the projection system as well as providing sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.[Fig No. 61115